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Heterogeneous integration requires multiple oxide removal strategies—dip flux, plasma, plasma + formic acid (FA), or FA alone. APTURA™ offers all these options in a single platform, eliminating the need to choose.
Seamless recipe transfer ensures consistent performance and accelerates ramp-up for high-volume manufacturing.
Real-time monitoring and optimization from anywhere, reducing downtime and improving yield.
Supports wafers, substrates, and panels (starting at 310mm x 310mm, scaling to larger formats) for next-generation packaging.